The SAB6100 is an R&D-grade bonding system designed for semiconductor and heterogeneous material integration.Utilizing room-temperature UHV bonding technology, it enables atomic-level surface activation and direct covalent bonding without heating. The system accommodates full-wafer and custom-shaped substrates, supports optional dedicated deposition chambers, and ensures process stability and repeatability.

The SAB6110 is a high-throughput bonding system designed for semiconductor and heterogeneous material integration. Utilizing room-temperature UHV bonding technology, it enables atomic-level surface activation and direct covalent bonding without heating. Featuring automated handling, a dedicated deposition chamber, and precision alignment, it ensures process stability with full-wafer compatibility.

The SAB6110 CST is a high-volume production system for semiconductor and heterogeneous material bonding, featuring a multi-chamber cluster design. It integrates activation, baking, sputtering (ion beam/magnetron), alignment, and bonding functions. Each chamber has independent dry and molecular pumps for rapid vacuum pumping. The activation module efficiently removes surface oxides, while the baking module rapidly eliminates moisture. It supports edge/Mark alignment, cassette automated loading, and meets high-volume production demands.

The SAB6210 enables room-temperature wafer bonding via plasma-activated hydrophilic surfaces. Featuring -OH group enrichment through plasma treatment and spin-rinse drying, it supports precision alignment and bonding in both atmospheric and vacuum environments.

The SAB6210HB is a hybrid bonding system designed for wafers with patterned Cu pads and dielectric materials (e.g., SiO₂ or SiCN) on their surfaces, where Cu pads exhibit dishing. It enriches -OH groups on dielectric surfaces via plasma treatment and water rinse/spin-drying, enabling high-precision alignment (via MARK) and bonding at room temperature in atmospheric environments.

The SAB6300 is a versatile, semi-automatic bonding system for R&D and small-batch production. It supports thermocompression bonding and anodic bonding, enabling diffusion bonding of metals (Au, Cu, Al, etc.), eutectic materials (Au-Sn, Al-Ge, etc.), or adhesives through precise temperature and pressure control. It also achieves glass-to-silicon bonding via electrostatic field application combined with heating and pressurization.

The SAB6310 is a fully automated bonding system compatible with thermocompression and anodic bonding. It integrates plasma activation, cleaning, alignment, and bonding modules for high-quality, high-throughput production.

The SAB6410TB is a fully automated temporary bonding system integrating spin coating, baking, alignment, and bonding functions. It bonds two wafers with adhesives to enable backside processing of device wafers.

The SAB6410DB is a fully automated debonding system that employs mechanical, thermal slip, or laser scanning methods for damage-free separation. Post-debonding, wafers and temporary carriers exhibit no damage, pattern layer defects, residue, watermarks, carbon ash, or contaminants after chemical or plasma cleaning.

The SAB8210CW is a fully automated C2W hybrid bonding system. It supports C2W hybrid bonding with patterned chips to achieve high-density Cu-Cu interconnects, as well as C2W hydrophilic bonding with unpatterned bare chips to form reconstituted wafers for subsequent chip patterning.

The SAB8210CWW is a fully automated hybrid bonding system integrating C2W (Chip-to-Wafer) and W2W (Wafer-to-Wafer) dual modes. It supports 8/12-inch wafers and handles ultra-thin chips (down to 35μm) of various sizes. The system enables parallel development and validation of C2W and W2W processes, significantly shortening the R&D-to-production transition timeline.

The SAB8300C2C is a semi-automatic flip-chip bonding system designed for R&D, sample validation, and small-batch production. It enables high-precision alignment and reliable interconnects between micro-bumps and pads in an inert gas or hydrogen radical environment.

The SAB8310CW is a fully automated C2W flip-chip (alignment thermocompression) bonding system for high-volume production. It supports automatic wafer/chip loading/unloading, with independent hydrogen radical and plasma activation chambers for high-quality fluxless TCB bonding.

The SAB9500 is a semi-automatic ultra-atomic beam polisher for ultra-precision surface polishing of 2-12 inch wafers or irregularly shaped samples. Compatible materials include Si, SiC, InP, GaAs, GaN, diamond, LN, LT, optical crystals, and more.

The SAB9510 is a fully automated ultra-atomic beam surface TRIM system with cassette-based automated loading/unloading, designed for high-volume semiconductor thin-film TRIM production.