Equipment Features
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- Flexible Debonding Methods
- Supports single or combined use of mechanical, thermal slip, or laser debonding.
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- Low-Stress Thermal Slip Debonding
- Independent temperature control for upper/lower plates and stable thermal slip process minimize breakage rates.
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- Non-Destructive Laser Debonding
- UV nanosecond laser with real-time focusing and power compensation achieves near-zero thermal damage.
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- Zero-Residue Debonding
- Chemical and plasma dry cleaning ensure >99.9% adhesive residue removal.
Specifications and Parameters
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ltemsSpecification
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Wafer size4、6、8、12inch
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Wafer loadCassette、SMIF、Foup Optional
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Debonding methodMechanical ,Thermal slide, laser debond
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Thermal Slip TemperatureMaximum Temperature 250°C independent upper/lower plate control
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Thermal Slip Speed0.1mm/s~70mm/s
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Laser Wavelength355nm
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Laser Spot PatternTop-hat flat-top beam spot
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Laser Maximum Scanning Range320mm*320mm
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Cleaning Chemical Type≥2 types
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Maximum Spin Speed for Chemical Cleaning3000rpm
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Plasma CleaningOptional
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Multi-module integratedDebonding, separation, chemical cleaning, plasma cleaning.