Features
-
- Flexible Debonding Methods
- Supports single or combined use of mechanical, thermal-sliding, or laser debonding.
-
- Low-stress Thermal Slip Debonding
- Independent temperature control for upper/lower plates, coupled with stable thermal-sliding control, minimizes breakage rates.
-
- Zero Damage Laser Debonding
- UV nanosecond laser with real-time focusing and power compensation achieves near-zero thermal damage during debonding.
-
- Zero-residue Debonding
- Chemical and plasma dry cleaning ensure >99.9% adhesive removal.
Specifications
-
ltemsSpecification
-
Wafer size4,6,8,12inch
-
Wafer loadCassette,SMIF,Foup Optional
-
Debonding methodMechanical ,Thermal-sliding, laser debond
-
Thermal-sliding TemperatureMaximum Temperature 250°C, independent upper/lower plate control
-
Thermal-sliding Speed0.1mm/s~70mm/s
-
Laser Wavelength355nm
-
Laser Spot ProfileTop-hat
-
Laser Maximum Scanning area320mm*320mm
-
Cleaning Chemical Type≥2
-
Maximum Spin Speed for Chemical Cleaning3000rpm
-
Plasma CleaningOptional
-
Multi-module integratedDebonding, separation, chemical cleaning, plasma cleaning.