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SAB82 Series
C2W/CWW Hybrid Bonding Equipment

Wafer and chip surfaces are plasma-activated and spin-cleaned, pre-bonded at room temperature, then annealed to achieve dielectric bonds and Cu-Cu interconnects. The post-bond accuracy ≤±100nm. Applications include multilayer stacking memories (NAND, DRAM, HBM), Micro-LEDs, CIS and SiPh.

Advantages
Applications
  • Interconnection between pixel layers and signal processing layers in 3D stacked image sensors.
  • Multi-layer stacking processes for NAND, DRAM, HBM, and other memory devices.
  • Integration of sensor structures with signal processing/control circuits in MEMS.
  • Interconnection of light-emitting devices and driving circuits in Micro-LED applications.
Product Series
Service Email:
sales@isaber-s.com

Address: No. 38, Binhai Innovation and Entrepreneurship Park, No. 4668 Xinbei Road, Binhai New Area, Tianjin

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